Author
Arelli, Prakash | |
DIERS, BRIAN - UNIV. OF ILLINOIS |
Submitted to: Cellular and Molecular Biology of Soybean Biennial Conference
Publication Type: Abstract Only Publication Acceptance Date: 7/15/2002 Publication Date: 12/19/2002 Citation: Arelli, P.R., Diers, B. 2002. Progress in mapping for scn resistance in soybean. Cellular and Molecular Biology of Soybean Biennial Conference. P. 204. Interpretive Summary: Technical Abstract: Genetic mapping and QTL analysis has been used to elucidate genetics of complex traits including resistance in soybean to soybean cyst nematode. Recently, DNA markers have contributed greatly to identification of QTLs and can be used for MAS of resistant soybeans. Three resistance QTLs were mapped from PI 209332 to LGs A, G and J. The QTL on LG A was in proximity to Rhg4 and a QTL on G was confirmed to be rhg1, and presumably, Rhg5 corresponds to QTL on LG J. Two of the major resistance QTLs from PI 437654 were also mapped to LGs A and G and a third was mapped to LG M which probably corresponds to rhg2. Most resistance from cv. Hartwig was mapped to primarily LG B. Several QTLs were mapped from Peking and LGs included A, F, C, B, H and I. Resistance in G. soja was mapped to LGs E and G, where no resistance was previously mapped. Recently, several QTLs were also mapped in two novel sources of resistance, PIs 438489B and 89772. A novel QTL on LG D1a was uncovered in PI 438489B and resistance to Race 14 (PI 88788 type) did not include QTLs on both LGs A2 and G. This is a unique type of resistance. LG E appears to be novel from PI 89772. There are some discrepancies in the results reported by several authors and these can be explained based on differences in the nematode populations, differences in the seed sources and lack of specific markers segregating for the region, or the markers used to map QTLs to LGs may not have been completely anchored. However, three markers, Satt 309, Satt 583 and A006 can be highly useful in MAS for increased selection efficiency to breeding cultivars with improved resistance. |