Author
NIU, CHEN - TEXAS TECH UNIVERSITY | |
KEBEDE, HIRUT - TEXAS TECH UNIVERSITY | |
AULD, DICK - TEXAS TECH UNIVERSITY | |
WOODWARD, JASON - TEXAS AGRILIFE | |
Burow, Gloria | |
WRIGHT, ROBERT - TEXAS TECH UNIVERSITY |
Submitted to: African Journal of Biotechnology
Publication Type: Peer Reviewed Journal Publication Acceptance Date: 7/10/2008 Publication Date: 8/18/2008 Citation: Niu, C., Kebede, H., Auld, D., Woodward, J., Burow, G.B., Wright, R. 2008. A safe inexpensive method to isolate high quality plant and fungal DNA in an open laboratory environment. African Journal of Biotechnology. 7(16):2818-2822. Interpretive Summary: The most commonly used plant DNA isolation methods use health hazardous chemicals (phenol and chloroform), which require special equipment to minimize exposure and may limit their application in some environments. Commercial DNA extraction kits are convenient and usually safe, but their high cost can be limiting, especially when isolating DNA from a large number of samples. Current reports on non phenol/chloroform protocols have not thoroughly examined the quality and suitability of the DNA for studies that require high precision. Here we describe a simple, economical and rapid phenol/chloroform free protocol to obtain high quality DNA from plant and fungal samples. Potassium ions are used to precipitate protein and other cellar molecules in SDS extraction buffer. Purified DNA is achieved using a low salt CTAB treatment. This SDS/CTAB protocol has been used to isolate high quality DNA from both plant and fungi with minimum cost and health concerns. Technical Abstract: A simple, economical and rapid phenol/chloroform free protocol to obtain high quality DNA from plant and fungal samples is described in this report. Potassium ions are used to precipitate protein and other cellar molecules in SDS extraction buffer. Purified DNA is achieved using a low salt CTAB treatment. This SDS/CTAB protocol has been used to isolate high quality DNA from both plant and fungi with minimum cost and health concerns. |